Kontron is presenting the KISS 4U V4 RPL Rackmount PC, the most powerful and flexible member of the Kontron KISS family. Based on a motherboard developed and manufactured by Kontron in Germany with 14th Generation i9/i7/i5/i3 processors of the 14th generation with up to 24 cores (8-Performance Cores and 16-Efficient Cores). The industrial PCs in rackmount format offer high performance and reliability as well as excellent energy efficiency. With their resistance to high temperatures, shock and vibration and the extensive storage options, the KISS 4U V4 RPL systems are ideal for use in demanding industrial environments and computing-intensive applications.
Power supplies for demanding applications available
Three GbE ports, two of them with up to 2.5 Gb/s and eight external USB ports including USB-C ensure high data throughput and connectivity. Four DIMM sockets with up to 128 GB and optional ECC memory ensure sufficient working memory. Equipped with DDR5 UDIMM 5600 memory, the KISS 4U V4 RPL also achieves a significant increase in performance compared to its predecessor. A wide range of internal and hot-swappable external storage media enables customized systems for any application. Systems are now available for industrial automation, video surveillance and medical technology markets in particular, which open up a new dimension in graphics applications with their four DisplayPort interfaces. Powerful power supply units are also available for AI and machine learning applications, allowing the installation of high-end GPU cards such as the NVIDIA A1000.
The new KISS 4U V4 RPL systems also support the highest security standards and allow real-time applications for control tasks in the control cabinet or data consolidation in the local cloud thanks to TSN features. Thanks to the effective cooling concept, the rackmount system can withstand ambient temperatures from 0 °C to +50 °C during 24/7 continuous operation. The high shock and vibration resistance also predestines the KISS V4 series for robust industrial applications.